Next generation lasers for semicon, lithography and holography

The future of high-tech innovation in fields such as semiconductor metrology, holography, and photolithography relies heavily on advancements in laser technology. These applications demand lasers that offer exceptional precision, stability, and reliability. TOPTICA Photonics provides multiple next generation single-frequency laser solutions that not only meet the stringent demands of these applications but also offer lower cost of ownership, making us the ideal partner for driving future innovations in these cutting-edge fields.

Key features & benefits

  • UV / RGB laser with watt-class output power
  • High efficiency, low Cost of Ownership
  • High coherence: > 100 m coherence length (< 1 MHz linewidth)
  • Excellent stability & reliability
  • Easy, hands-off operation

Explore laser choices by application or specification


Holography / HOE Manufacturing

The use of laser holography has come a long way, since it started in the 1960s. Unlike traditional holograms with a fixed image, today's holographic applications are diverse, extending from security holograms on banknotes and passports to the creation of holographic optical elements (HOEs) for AR/VR headsets.

Laser requirementsCustomer benefits
RGB/VIS wavelength (440 - 660 nm)White light holograms
Wavelength tuning optionMatch recording wavelength to illumination spectrum
Long coherence lengthHigh pattern contrast
High output powershort exposure time
large exposure area
High power stabilityHigh yield at high process speed
Wavelength accuracy & stabilityReproducibility

Matching lasers

SystemKey wavelengthsMax. output power
ALS-VIS series488 nm / 514 nm / 532 nm2 W / 8 W / 10 W
DLC TA-SHG pro with tuning option445 … 470 nm*
520 … 535 nm*
615 … 640 nm*
Up to 1 W

* Typical tuning range within the given center wavelength range: 10 nm


Interference Lithography & Grating Writing

Interference lithography and holography share several similarities, as both techniques rely on the principles of light interference to create patterns or structures on a photosensitive material. But while the interference pattern in holography encodes the phase and amplitude information of light, which can represent basically any 3D image or object, the pattern in interference lithography typically form periodic structures, such as lines, grids, or dots. This method is widely used in the production of nanoscale and microscale structures, e.g. diffraction gratings or optical filters.

Laser requirementsCustomer benefits
"Short" wavelength (violet - DUV)Higher resolution, enabling the production of finer patterns
Long coherence lengthHigh feauture contrast
High output powerProcess speed, large area imaging
High power stabilityHigh yield at high process speed
Wavelength accuracy & stabilityReproducibility, stable interference pattern

Matching lasers

SystemKey wavelengthsMax. output power
TopWave 405405 nm1 W
TopWave DUV229 nm / 257 nm / 266 nm10 mW / 15 mW / 300 mW
DLC TA-SHG pro365 nm, 390 nmUp to 1 W
DLC TA-FHG pro193 nm, 213 nm, 244 nm, 257 nmUp to 300 mW

Microlithography, Direct Laser Writing, Mask Writing

Mature semiconductor nodes are vital in the chip manufacturing process due to their cost-effectiveness, reliability, and suitability for a wide range of applications (e.g. IoT devices). It all starts with the right laser source if you want to achieve those attributes with your microlithography tool or photomask writer.

Laser requirementsCustomer benefits
"Short" wavelength (violett - DUV)Higher spatial resolution, small feature size
High output powerIncreased process speed
High power stabilityHigh yield at high process speed
Low noiseReproducibility
Stable pointingResolution

Matching lasers

SystemKey wavelengthsMax. output power
TopWave 405405 nm1 W
TopWave DUV229 nm / 257 nm / 266 nm10 mW / 15 mW / 300 mW
iBeam smart 375 nm, 405Up to 0.45 W
DLC TA-SHG pro365 nm, 390 nmUp to 1 W

Gas Laser Replacement

Gas lasers have been an integral part of the semiconductor industry since its beginnings. But the industry, which is at the forefront of technological innovation, faces an pressing challenge: decarbonizing its value chain. The integration of diode and fiber laser technology offers a clear and simple path to reducing carbon emissions and improving sustainability. These advanced laser systems deliver precise, efficient and energy-saving performance, ensuring a reliable supply for decades to come.

WavelengthLegacy gas laserSuggested replacement laserAvailable wavelengthMax. output power
647.1 nmKr+ LaserDLC TA-SHG pro
DLC RFA-SHG pro
635 nm .. 650 nm1 W
6 W
632.8 nmHeNeiBeam smart WS
DFB pro
633 nm, 638 nm
633 nm
up to 120 mW
10 mW
514.5 nmAr+ LaserALS-VIS series514.5 nm8 W
488.0 nmAr+ LaserALS-VIS series488 nm2 W
457.9 nmAr+ LaserDLC TA-SHG pro450 nm .. 470 nmup to 1.3 W
413.1 nmKr+ Laser (h-line)TopWave 405405 nm (413 nm)1 W (0.7 W)
406.7 nmKr+ Laser (h-line)TopWave 405
TopMode
405 nm1 W
100 mW
363.8 nmAr+ Laser (i-line)DLC TA-SHG pro365 nm50 mW
264.4 nmAr+ Laser SHGTopWave DUV266 nm300 mW
257 nmAr+ Laser SHGTopWave DUV
DLC TA-FHG pro
257 nm15 mW
Up to 200 mW
244 nmAr+ Laser SHGDLC TA-FHG pro244 nmUp to 200 mW

Semicon Inspection and Metrology

Semiconductor inspection and semiconductor metrology are two crucial processes in semiconductor manufacturing. While inspection aims to detect defects and ensure the wafer is free from contamination and other physical anomalies, semiconductor metrology focuses on measuring the exact dimensions and properties of semiconductor features to ensure they meet design specifications. Optical inspection (e.g. brightfield and darkfield microscopy) and metrology techniques (e.g. ellipsometry or scatterometry rely on high-precision, low-noise laser system across an extended wavelength range spanning from the DUV to the NIR.

Laser requirementsCustomer benefits
DUV/VIS/NIR wavelengthMatching wavelength for measurement task, e.g. DUV wavelength for increased resolution
Low noiseBest signal to noise ratio
Wavelength accuracy & stabilityReproducibility
Long lifetimeLow cost of ownership, sustainability

Matching lasers

SystemKey wavelengthsMax. output power
iBeam smart 375 nm .. 850 nmUp to 450 mW
iBeam smart WS633 nm, 638 nm, 785 nm, 808 nm, 828 nm, 850 nmup to 120 mW
DFB pro633 nm, 780/785 nm, 852 nmup to 120 mW
TopWave DUV229 nm / 257 nm / 266 nm10 mW / 15 mW / 300 mW
DLC TA-FHG pro193 nm, 213 nm, 244 nm, 257 nmUp to 300 mW

Explore Laser Choices by Wavelength and Power

SystemKey wavelengthsMax. output powerLinewidth (typ.)
ALS-VIS series488 nm / 514 nm / 532 nm2 W / 8 W / 10 W< 0.5 MHz
Top Mode405 nm100 mW< 5 MHz
TopWave 405405 nm1 W< 25 MHz
TopWave DUV229 nm / 257 nm / 266 nm10 mW / 15 mW / 300 mW< 1 MHz
DLC TA-SHG pro with tuning option445 … 470 nm*
520 … 535 nm*
615 … 640 nm*
Up to 1 W< 0.5 MHz
DLC TA-SHG pro365 nm, 390 nm, 405 nm, 560 nm, 633 nmUp to 1 W< 0.5 MHz
DLC TA-FHG pro193 nm, 213 nm, 244 nm, 257 nmUp to 300 mW< 1 MHz
DFB pro633 nm, 780/785 nm, 852 nmup to 120 mW< 2 MHz
iBeam smart WS633 nm, 638 nm, 685 nm, 785 nm, 852 nmup to 120 mW< 25 MHz
iBeam smart375 nm .. 850 nmup to 450 mW0.5 nm

* Typical tuning range within the given center wavelength range: 10 nm